國(guó)產(chǎn)SiC碳化硅MOSFET功率器件可靠性及一致性如何確保？

電力電子系統(tǒng)研發(fā)制造商一般需要碳化硅MOSFET功率器件供應(yīng)商提供可靠性測(cè)試報(bào)告的原始數(shù)據(jù)和器件封裝的FT數(shù)據(jù)。

SiC碳化硅MOSFET可靠性報(bào)告原始數(shù)據(jù)主要來(lái)自以下可靠性測(cè)試環(huán)節(jié)的測(cè)試前后的數(shù)據(jù)對(duì)比，通過(guò)對(duì)齊可靠性報(bào)告原始數(shù)據(jù)測(cè)試前后漂移量的對(duì)比，從而反映器件的可靠性控制標(biāo)準(zhǔn)及真實(shí)的可靠性裕量。SiC碳化硅MOSFET可靠性報(bào)告原始數(shù)據(jù)主要包括以下數(shù)據(jù):

SiC碳化硅MOSFET高溫反偏High Temperature Reverse Bias HTRB Tj=175℃VDS=100%BV

SiC碳化硅MOSFET高溫柵偏（正壓）High Temperature Gate Bias（+） HTGB（+） Tj=175℃VGS=22V

SiC碳化硅MOSFET高溫柵偏（負(fù)壓）High Temperature Gate Bias（-） HTGB（-） Tj=175℃VGS=-8V

SiC碳化硅MOSFET高壓高濕高溫反偏High Voltage, High Humidity, High Temp. Reverse Bias HV-H3TRB Ta=85℃RH=85%VDS=80%BV

SiC碳化硅MOSFET高壓蒸煮Autoclave AC Ta=121℃RH=100%15psig

SiC碳化硅MOSFET溫度循環(huán)Temperature Cycling TC -55℃ to 150℃

SiC碳化硅MOSFET間歇工作壽命Intermittent Operational Life IOL △Tj≥100℃Ton=2minToff=2min

FT數(shù)據(jù)來(lái)自碳化硅MOSFET功率器件FT測(cè)試(Final Test，也稱為FT)是對(duì)已制造完成的碳化硅MOSFET功率器件進(jìn)行結(jié)構(gòu)及電氣功能確認(rèn)，以保證碳化硅MOSFET功率器件符合系統(tǒng)的需求。

通過(guò)分析碳化硅MOSFET功率器件FT數(shù)據(jù)的關(guān)鍵數(shù)據(jù)（比如V(BR)DSS，VGS(th)，RDS(on)，

IDSS）的正態(tài)分布，可以定性碳化硅MOSFET功率器件材料及制程的穩(wěn)定性，這些數(shù)據(jù)的定性對(duì)電力電子系統(tǒng)設(shè)計(jì)及大批量制造的穩(wěn)定性也非常關(guān)鍵。

 

基本™（BASiC Semiconductor）第二代SiC碳化硅MOSFET兩大主要特色：

 

1.出類拔萃的可靠性：相對(duì)競(jìng)品較為充足的設(shè)計(jì)余量來(lái)確保大規(guī)模制造時(shí)的器件可靠性。

基本™（BASiC Semiconductor）第二代SiC碳化硅MOSFET 1200V系列擊穿電壓BV值實(shí)測(cè)在1700V左右，高于市面主流競(jìng)品，擊穿電壓BV設(shè)計(jì)余量可以抵御碳化硅襯底外延材料及晶圓流片制程的擺動(dòng)，能夠確保大批量制造時(shí)的器件可靠性，這是基本™（BASiC Semiconductor）第二代SiC碳化硅MOSFET布袋除塵器關(guān)鍵的品質(zhì). 基本™（BASiC Semiconductor）第二代SiC碳化硅MOSFET雪崩耐量裕量相對(duì)較高，也增強(qiáng)了在電力電子系統(tǒng)應(yīng)用中的可靠性。

 

2.可圈可點(diǎn)的器件性能：同規(guī)格較小的Crss帶來(lái)出色的開(kāi)關(guān)性能。

基本™（BASiC Semiconductor）第二代SiC碳化硅MOSFET反向傳輸電容Crss 在市面主流競(jìng)品中是比較小的，帶來(lái)關(guān)斷損耗Eoff也是市面主流產(chǎn)品中非常出色的，優(yōu)于部分海外競(jìng)品，特別適用于LLC應(yīng)用.

 

Basic™ (BASiC Semiconductor) second generation SiC silicon carbide MOSFET has two main features:

1. Outstanding reliability: Compared with competing products, there is sufficient design margin to ensure device reliability during mass manufacturing.

The breakdown voltage BV value of BASiC Semiconductor's second-generation SiC silicon carbide MOSFET 1200V series is measured to be around 1700V, which is higher than mainstream competing products on the market. The breakdown voltage BV design margin can withstand silicon carbide substrate epitaxial materials and wafers. The swing of the tape-out process can ensure device reliability during mass manufacturing, which is the most critical quality of BASiC Semiconductor’s second-generation SiC silicon carbide MOSFET. BASiC Semiconductor’s second-generation SiC silicon carbide MOSFET The relatively high avalanche tolerance margin also enhances reliability in power electronic system applications.

2. Remarkable device performance: Smaller Crss with the same specifications brings excellent switching performance.

BASiC Semiconductor's second-generation SiC silicon carbide MOSFET reverse transmission capacitor Crss is relatively small among mainstream competing products on the market, and its turn-off loss Eoff is also very good among mainstream products on the market, better than some overseas competing products. , especially suitable for LLC applications, typical applications such as charging pile power module downstream DC-DC applications.

 

Ciss：輸入電容（Ciss＝Cgd＋Cgs） ⇒柵極-漏極和柵極-源極電容之和：它影響延遲時(shí)間；Ciss越大，延遲時(shí)間越長(zhǎng)。基本™（BASiC Semiconductor）第二代SiC碳化硅MOSFET 優(yōu)于主流競(jìng)品。

Crss：反向傳輸電容（Crss＝Cgd） ⇒柵極-漏極電容：Crss越小，漏極電流上升特性越好，這有利于MOSFET的損耗，在開(kāi)關(guān)過(guò)程中對(duì)切換時(shí)間起決定作用，高速驅(qū)動(dòng)需要低Crss。

Coss：輸出電容（Coss＝Cgd＋Cds）⇒柵極-漏極和漏極-源極電容之和：它影響關(guān)斷特性和輕載時(shí)的損耗。如果Coss較大，關(guān)斷dv／dt減小，這有利于噪聲。但輕載時(shí)的損耗增加。

 

傾佳電子（Changer Tech）致力于國(guó)產(chǎn)碳化硅（SiC）MOSFET功率器件在電力電子市場(chǎng)的推廣！Changer Tech-Authorized Distributor of BASiC Semiconductor which committed to the promotion of BASiC™ silicon carbide (SiC) MOSFET power devices in the power electronics market!

 

 

傾佳電子（Changer Tech）專業(yè)分銷的基本™第二代碳化硅SiC MOSFET主要有B2M160120H，B2M160120Z，B2M160120R，B2M080120H,B2M080120Z，B2M080120R，B2M018120H，B2M018120Z，B2M020120Y，B2M065120H，B2M065120Z，B2M065120R，B2M040120H，B2M040120Z，B2M040120R，B2M032120Y，B2M018120Z。適用大功率電力電子裝置的SiC MOSFET模塊，半橋SiC MOSFET模塊，ANPC三電平碳化硅MOSFET模塊，T型三電平模塊，MPPT BOOST SiC MOSFET模塊。

B2M032120Y國(guó)產(chǎn)替代英飛凌IMZA120R030M1H，安森美NTH4L030N120M3S以及C3M0032120K。

B2M040120Z國(guó)產(chǎn)替代英飛凌IMZA120R040M1H，安森美NTH4L040N120M3S，NTH4L040N120SC1以及C3M0040120K，意法SCT040W120G3-4AG。

B2M020120Y國(guó)產(chǎn)替代英飛凌IMZA120R020M1H，安森美NTH4L020N120SC1，NTH4L022N120M3S以及C3M0021120K，意法SCT015W120G3-4AG。

B2M1000170R國(guó)產(chǎn)代替英飛凌IMBF170R1K0M1，安森美NTBG1000N170M1以及C2M1000170J。

B2M065120H國(guó)產(chǎn)代替安森美NTHL070N120M3S。

B2M065120Z國(guó)產(chǎn)代替英飛凌IMZ120R060M1H，安森美NVH4L070N120M3S，C3M0075120K-A，意法SCT070W120G3-4AG。

B2M160120Z國(guó)產(chǎn)代替英飛凌AIMZHN120R160M1T，AIMZH120R160M1T

B2M080120Z國(guó)產(chǎn)代替英飛凌AIMZHN120R080M1T，AIMZH120R080M1T

B2M080120R國(guó)產(chǎn)代替英飛凌IMBG120R078M2H

B2M040120Z國(guó)產(chǎn)替代英飛凌AIMZHN120R040M1T，AIMZH120R040M1T

B2M040120R國(guó)產(chǎn)替代英飛凌IMBG120R040M2H

B2M018120R國(guó)產(chǎn)替代英飛凌IMBG120R022M2H

B2M018120Z國(guó)產(chǎn)替代英飛凌AIMZH120R020M1T，AIMZH120R020M1T

B2M065120Z國(guó)產(chǎn)替代英飛凌AIMZHN120R060M1T，AIMZH120R060M1T

 

 

基本™B2M第二代碳化硅MOSFET器件主要特色：

• 比導(dǎo)通電阻降低40%左右

• Qg降低了60%左右

• 開(kāi)關(guān)損耗降低了約30%

• 降低Coss參數(shù)，更適合軟開(kāi)關(guān)

• 降低Crss，及提高Ciss/Crss比值,降低器件在串?dāng)_行為下誤導(dǎo)通風(fēng)險(xiǎn)

• 最大工作結(jié)溫175℃• HTRB、 HTGB+、 HTGB-可靠性按結(jié)溫Tj=175℃通過(guò)測(cè)試

• 優(yōu)化柵氧工藝，提高可靠性

• 高可靠性鈍化工藝

• 優(yōu)化終端環(huán)設(shè)計(jì)，降低高溫漏電流

• AEC-Q101